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THE STANDARD ETCH CELL

簡介

C-A-STD_ETCH-PEEK, C-A-STD_ETCH-PTFE

One of the most common applications of an electrochemical etching cell is the preparation of a Nanocrystalline Porous Silicon Layer on a single crystal Si wafer.

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One of the most common applications of an electrochemical etching cell is the preparation of a Nanocrystalline Porous Silicon Layer on a single crystal Si wafer.

Application note
To perform an electrochemical process, a square conducting sample is placed on the cell base, using a piece of aluminum foil as a back contact. The setup is sealed by an O-ring to prevent electrolyte leakage. The cell is filled with an electrolyte, and the wire electrode is immersed in the solution as a counter electrode. An electric current is passed between the aluminum back contact and the wire electrode for a certain amount of time. After the process, the cell elements should be washed several times with ethanol and dried under the nitrogen flow. See the assembly demonstration here.

Material:
PEEK
PTFE

Specification
nominal exposure area: 1.20 cm2
electrolyte volume: 4.8 mL
minimum sample size: 20 mm x 20 mm
maximum sample width: 31 mm

Intrastat data
HS Code: 85433070
Country of Origin: Sweden
NET weight: 200 g

Product includes
1 x cell base - 0058CPEMASM
1 x cell top - 0060CPEMASM
1 x set of screws - 0057PNYCM